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HEIDELBERG INSTRUMENTS MIKROTECHNIK GMBH

Overview
  • Total Patents
    43
About

HEIDELBERG INSTRUMENTS MIKROTECHNIK GMBH has a total of 43 patent applications. Its first patent ever was published in 1991. It filed its patents most often in United States, Germany and WIPO (World Intellectual Property Organization). Its main competitors in its focus markets optics, measurement and audio-visual technology are LITEL INSTR INC, ANVIK CORP and E SOL INC.

Patent filings per year

Chart showing HEIDELBERG INSTRUMENTS MIKROTECHNIK GMBHs patent filings per year from 1900 to 2020

Top inventors

# Name Total Patents
#1 Kaplan Roland 21
#2 Vogler Sven 11
#3 Buchner Christian 9
#4 Weikert Robert 7
#5 Wijnaendts-Van-Resandt Roelof 7
#6 Wijnaendts Roelof 5
#7 Preuss Sven 5
#8 Sollner Juergen 3
#9 Mangold Alexander 3
#10 Jehle Joachim 3

Latest patents

Publication Filing date Title
DE102009020320A1 Method and device for increasing the resolution and / or the speed of exposure systems
DE10317050A1 Forming image of mask on substrate for photolithography involves moving illumination and optical units relative to mask and substrate, forming image depending on detected substrate distortions
EP1490728A1 Method and device for light modulation by granular gas
CN1395677A Method and arrangement for optically detecting position of moveable mirror
DE10035446A1 Micro bore hole generation method involves determining substrate position using interferometer; computer system processes position signal into table position
DE10028790A1 Laser lithographic manufacture of circuit board by direct marking by exposing photoresist at different wavelength than that used to expose latent mask
DE10006081A1 Method for producing three-dimensional micro-structures in a photo-lacquer, deposited on a substrate, using a focussed laser beam the wavelength of which lies above that corresponding to the lacquer's spectral sensitivity
DE19829674A1 Layer technology utilizing direct writing for lithography of semiconductor chips
DE19529656A1 Process for the production of microstructures
DE4442596C1 Position measuring error correction system for lithography device
DE4408507A1 Lithographic process
DE4124025A1 Lithographic process for positioning microstructures