| # | Country | Total Patents | |
|---|---|---|---|
| #1 | United States | 6 | |
| #2 | Republic of Korea | 5 | |
| #3 | China | 2 | |
| #4 | Japan | 2 | |
| #5 | WIPO (World Intellectual Property Organization) | 2 | |
| #6 | EPO (European Patent Office) | 1 | |
| #7 | Hong Kong | 1 | |
| #8 | Taiwan | 1 |
| # | Industry | |
|---|---|---|
| #1 | Optics | |
| #2 | Audio-visual technology | |
| #3 | Semiconductors |
| # | Technology | |
|---|---|---|
| #1 | Photomechanical semiconductor production | |
| #2 | Casings and printed circuits | |
| #3 | Semiconductor devices |
| # | Name | Total Patents |
|---|---|---|
| #1 | Meisburger William Daniel | 11 |
| #2 | Dohse Hans | 6 |
| #3 | Hans Dohse | 1 |
| #4 | Dohse Hans H | 1 |
| #5 | Daniel Meisburger William | 1 |
| Publication | Filing date | Title |
|---|---|---|
| US2009086207A1 | Alignment system for optical lithography | |
| KR20110056342A | Continuous direct-write optical lithography |