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ANVIK CORP

Overview
  • Total Patents
    61
About

ANVIK CORP has a total of 61 patent applications. Its first patent ever was published in 1992. It filed its patents most often in United States, WIPO (World Intellectual Property Organization) and EPO (European Patent Office). Its main competitors in its focus markets optics, audio-visual technology and transport are MICRONIC LASER SYSTEMS AB, E SOL INC and SVG LITHOGRAPHY SYSTEMS INC.

Patent filings in countries

World map showing ANVIK CORPs patent filings in countries

Patent filings per year

Chart showing ANVIK CORPs patent filings per year from 1900 to 2020

Top inventors

# Name Total Patents
#1 Jain Kanti 46
#2 Kling Carl C 12
#3 Farmiga Nestor O 11
#4 Dunn Thomas J 11
#5 Zemel Marc I 9
#6 Klosner Marc A 8
#7 Hoffman Jeffrey M 6
#8 Kuchibhotla Sivarama K 5
#9 Zemel Marc 5
#10 Raghunandan Shyam 3

Latest patents

Publication Filing date Title
US2013250263A1 Pulsed laser source with high repetition rate
US2010098816A1 Freshness prolonging smart beverage container
US2009107966A1 Vacuum debris removal system
US2010108820A1 Highly-integrated low-mass plastic film
US2006012766A1 Versatile maskless lithography system with multiple resolutions
US2006001845A1 Illumination system optimized for throughput and manufacturability
US2005237764A1 High-brightness, compact illuminator with integrated optical elements
US7195375B2 Compact, high-efficiency, energy-recycling illumination system
US7106415B2 Illumination compensator for curved surface lithography
US7139448B2 Photonic-electronic circuit boards
US6903808B2 Alignable low-profile substrate chuck for large-area projection lithography
US7226542B2 Fluid treatment apparatus
US6870554B2 Maskless lithography with multiplexed spatial light modulators
US6774983B2 Distributed projection system
US6664012B2 Through-the-lens alignment for photolithography
US6707534B2 Maskless conformable lithography
US6717650B2 Maskless lithography with sub-pixel resolution
US6625328B2 Text-moire' minimization
US6624382B2 Configured-hole high-speed drilling system for micro-via pattern formation, and resulting structure
US6515257B1 High-speed maskless via generation system