FUJITSU VLSI LTD has a total of 19 patent applications. Its first patent ever was published in 1990. It filed its patents most often in Japan, Republic of Korea and United States. Its main competitors in its focus markets computer technology, machines and semiconductors are OHNO HIDEO, SHUKH ALEXANDER MIKHAILOVICH and OHMORI HIROYUKI.
# | Country | Total Patents | |
---|---|---|---|
#1 | Japan | 7 | |
#2 | Republic of Korea | 5 | |
#3 | United States | 4 | |
#4 | Canada | 1 | |
#5 | EPO (European Patent Office) | 1 | |
#6 | Taiwan | 1 |
# | Industry | |
---|---|---|
#1 | Computer technology | |
#2 | Machines | |
#3 | Semiconductors | |
#4 | Machine tools | |
#5 | Electrical machinery and energy | |
#6 | Environmental technology |
# | Name | Total Patents |
---|---|---|
#1 | Hiraoka Naoki | 3 |
#2 | Yamamoto Hotaka | 3 |
#3 | Osuda Hiroshi | 3 |
#4 | Tanaka Masato | 3 |
#5 | Sano Seiji | 3 |
#6 | Masaya Gatayama | 2 |
#7 | Satoru Miyoshi | 2 |
#8 | Akao Kiyoshi | 2 |
#9 | Shimbayashi Kohji | 1 |
#10 | Genichi Ganajawa | 1 |
Publication | Filing date | Title |
---|---|---|
JP2002280450A | Semiconductor device and method for manufacturing it | |
JP2001196365A | Method and device for film formation and producing method for semiconductor device | |
KR100214174B1 | Semiconductor fabricating method | |
JPH11342356A | Substrate treating device and substrate treatment | |
JPH11340185A | Device and system for treating wafer | |
JPH11333390A | Substrate treating apparatus and method therefor | |
JPH11290653A | Process and device for removing gaseous pollutant | |
JPH04225547A | Wafer storing device |