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ELIONIX KK

Overview
  • Total Patents
    22
About

ELIONIX KK has a total of 22 patent applications. Its first patent ever was published in 1990. It filed its patents most often in Japan. Its main competitors in its focus markets measurement and environmental technology are NAMBITION GMBH, HITACHI KENKI FINETECH CO LTD and BRUKER NANO INC.

Patent filings in countries

World map showing ELIONIX KKs patent filings in countries
# Country Total Patents
#1 Japan 22

Patent filings per year

Chart showing ELIONIX KKs patent filings per year from 1900 to 2020

Focus industries

Top inventors

# Name Total Patents
#1 Hotta Masanao 9
#2 Ono Susumu 5
#3 Motome Seigo 4
#4 Kato Takahisa 2
#5 Okazaki Hisashi 2
#6 Kojima Yasuhiko 2
#7 Shimamoto Atsushi 1
#8 Kobayashi Hayato 1
#9 Usui Kiyokatsu 1
#10 Yoshida Masayuki 1

Latest patents

Publication Filing date Title
JP2014145605A Surface force measuring method, and surface force measuring apparatus
JP2008266765A Apparatus for forming nanoparticles using electron beam
JP2008130483A Electron beam fusion device
JP2006026660A Surface smoothing device using electron beam, and method for treating surface of metal mold
JP2004335205A Electron beam lithography system
JP2004034300A Micro-extruder
JP2003161684A Indenting test apparatus
JP2002141012A Electron beam fine processing device
JPH10172505A Charged particle deflecting system
JPH10142124A Apparatus for surface treatment of sample using ion gun
JPH07208922A Fine displacement measuring instrument
JPH06167585A Heat generation device
JPH06103953A Thin film forming method using metal ions and its device
JPH05234558A Reflected electron detector for scanning electron microscope
JPH05234552A Scanning electron microscope
JPH05225936A Object lens for scanning electron microscope
JPH04355041A Secondary electron detector
JPH04363852A Ion beam processing device
JPH04363851A Ion beam machining device
JPH04221824A Sample table for plasma etching device