DEVILLIERS ANTON has a total of 12 patent applications. Its first patent ever was published in 2008. It filed its patents most often in United States and WIPO (World Intellectual Property Organization). Its main competitors in its focus markets semiconductors, optics and surface technology and coating are CSMC TECH CORP, ITO YOSHITAKE and NANJING JINGQU INTEGRATED CIRCUIT CO LTD.
# | Country | Total Patents | |
---|---|---|---|
#1 | United States | 8 | |
#2 | WIPO (World Intellectual Property Organization) | 4 |
# | Industry | |
---|---|---|
#1 | Semiconductors | |
#2 | Optics | |
#3 | Surface technology and coating |
# | Technology | |
---|---|---|
#1 | Semiconductor devices | |
#2 | Photomechanical semiconductor production | |
#3 | Single-crystal-growth | |
#4 | Nonlinear optics |
# | Name | Total Patents |
---|---|---|
#1 | Devilliers Anton | 12 |
#2 | Sills Scott | 5 |
#3 | Hyatt Michael | 3 |
#4 | Byers Erik | 2 |
#5 | Sandhu Gurtej S | 2 |
#6 | Schrinsky Alex | 1 |
#7 | Zhu Hongbin | 1 |
#8 | Zhang Zishu | 1 |
Publication | Filing date | Title |
---|---|---|
US2011316021A1 | Epitaxial growth method | |
US2011305997A1 | Methods of forming a pattern in a material and methods of forming openings in a material to be patterned | |
US2011297646A1 | Methods of forming patterns on substrates | |
US2011217843A1 | Patterning mask and method of formation of mask using step double patterning | |
US2010130016A1 | Methods of forming a masking pattern for integrated circuits | |
WO2010024988A2 | Methods of forming a photoresist-comprising pattern on a substrate | |
US2009291397A1 | Methods of forming structures supported by semiconductor substrates |