| # | Country | Total Patents | |
|---|---|---|---|
| #1 | Republic of Korea | 4 | |
| #2 | China | 3 | |
| #3 | Taiwan | 2 | |
| #4 | WIPO (World Intellectual Property Organization) | 2 |
| # | Industry | |
|---|---|---|
| #1 | Optics | |
| #2 | Electrical machinery and energy | |
| #3 | Semiconductors |
| # | Technology | |
|---|---|---|
| #1 | Photomechanical semiconductor production | |
| #2 | Semiconductor devices | |
| #3 | Semiconductor light sources | |
| #4 | Lighting device details | |
| #5 | Optical systems |
| # | Name | Total Patents |
|---|---|---|
| #1 | Park Jong Won | 11 |
| #2 | Song Woo Ree | 11 |
| #3 | Jung Hae Il | 11 |
| #4 | Cho Nam Jik | 11 |
| #5 | In Chi Eok | 11 |
| Publication | Filing date | Title |
|---|---|---|
| CN107924134A | Exposure light source modular unit and the exposure device for being provided with the light source module unit | |
| KR20170022877A | UV LED light source module unit for exposure photolithography process and exposure photolithography apparatus used the same | |
| KR20170091905A | UV LED light source module unit for exposure photolithography process and exposure photolithography apparatus used the same | |
| KR20170015075A | UV LED light source module unit for exposure photolithography process and exposure photolithography apparatus used the same | |
| KR101593963B1 | UV LED light source module unit for exposure photolithography process and exposure photolithography apparatus used the same |