CHEM ENTPR CORP E has a total of 16 patent applications. Its first patent ever was published in 2011. It filed its patents most often in China, Germany and Japan. Its main competitors in its focus markets environmental technology, surface technology and coating and semiconductors are CIE POWER TAIXING TECH CO LTD, SUZHOU MAIZHENG TECH CO LTD and NCD CO.
# | Country | Total Patents | |
---|---|---|---|
#1 | China | 3 | |
#2 | Germany | 3 | |
#3 | Japan | 3 | |
#4 | Taiwan | 3 | |
#5 | United States | 3 | |
#6 | Republic of Korea | 1 |
# | Industry | |
---|---|---|
#1 | Environmental technology | |
#2 | Surface technology and coating | |
#3 | Semiconductors | |
#4 | Audio-visual technology | |
#5 | Basic materials chemistry |
# | Name | Total Patents |
---|---|---|
#1 | Hsu Su-Fei | 11 |
#2 | Liu Michael | 8 |
#3 | Chou Chia Wei | 6 |
#4 | Liao Cheng-Kai | 3 |
#5 | Hsu Su Fei | 2 |
#6 | Tsai Cheng-Ying | 2 |
#7 | Liao Cheng Kai | 2 |
#8 | Chou Chia-Wie | 2 |
#9 | Yifeng Liu | 1 |
#10 | Wei Chou Chia | 1 |
Publication | Filing date | Title |
---|---|---|
JP2015161015A | Etching liquid capable of reducing galvanic effect effectively | |
US8999194B1 | Etching solution capable of effectively reducing galvanic effect | |
KR20150095086A | Etching Solution Capable of Effectively Reducing Galvanic Effect | |
TW201520375A | Etching solution capable of effectively reducing galvanic effect | |
CN104674222A | Etching liquid capable of effectively retarding galvanic effect | |
US2011192316A1 | Electroless plating solution for providing solar cell electrode | |
US2011195542A1 | Method of providing solar cell electrode by electroless plating and an activator used therein |