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CEOS GMBH

Overview
  • Total Patents
    82
About

CEOS GMBH has a total of 82 patent applications. Its first patent ever was published in 1989. It filed its patents most often in Germany, EPO (European Patent Office) and United States. Its main competitors in its focus markets electrical machinery and energy, micro-structure and nano-technology and audio-visual technology are ADAMEC PAVEL, LIGHTLAB AB and STANDAART A.

Patent filings in countries

World map showing CEOS GMBHs patent filings in countries

Patent filings per year

Chart showing CEOS GMBHs patent filings per year from 1900 to 2020

Top inventors

# Name Total Patents
#1 Uhlemann Stephan 36
#2 Rose Harald 29
#3 Zach Joachim 25
#4 Mueller Heiko 15
#5 Haider Maximilian 13
#6 Weissbaecker Christoph 6
#7 Zach Joachim Dr 5
#8 Kallenbach Matthias 5
#9 Schmid Peter 5
#10 Rose Harald Prof Dr 3

Latest patents

Publication Filing date Title
DE102011009954A1 proofreader
DE102010054541A1 proofreader
DE102009010774A1 Method and apparatus for image contrast generation by phase shift
DE102007058443A1 Corrector for axial and extra-axial beam path and TEM with it
DE102007049816B3 proofreader
DE102007045874A1 multipole
JP2007280966A Electrooptic lens system
DE102007024353A1 Monochromator and beam source with monochromator
DE102006055510A1 Phase plate, image forming method and electron microscope
DE102006017686A1 Electron-optical corrector for aplanatic imaging systems
US2008283749A1 Corrective for eliminating the third-order aperture aberration and the first-order, first-degree axial, chromatic aberration
DE102005050810A1 Electron optics corrector of third order opening errors and anisotropic azimuthal components of the outer axial coma of the third order uses at least three coaxial hexapolar fields and spherical lenses
DE10161680A1 Lens structure for applying electrons to transfer areas of an object's surface into an image surface has a laterally sliding optical axis for corpuscular rays.
DE10159308A1 Particle optical corrector
DE10136190A1 Slit lens arrangement for particle beam e.g. for electron or ion beam lithography, uses 2 combined lenses each having electrostatic cylindrical lens and magnetic quadrupole lens
DE10102527A1 Electrostatic corrector for removing color aberrations in particle lenses has a straight optical axis and two correcting pieces behind each other along the optical axis each with electrical quadrupolar and round lens fields.
DE10020382A1 Beam generation system for electrons or ion beams of high monochrome or high current density
DE10003127A1 Method for determining geometrically optical aberrations
DE19944857A1 Electron-optical lens arrangement with a widely displaceable axis
DE19926927A1 Electrostatic corrector to remove the color error from particle lenses