| # | Country | Total Patents | |
|---|---|---|---|
| #1 | China | 11 | |
| #2 | EPO (European Patent Office) | 2 | |
| #3 | United Kingdom | 1 | |
| #4 | United States | 1 | |
| #5 | WIPO (World Intellectual Property Organization) | 1 |
| # | Technology | |
|---|---|---|
| #1 | Electric switches | |
| #2 | Static stores | |
| #3 | Microstructural devices | |
| #4 | Making microstructural devices | |
| #5 | Capacitors and switching devices | |
| #6 | Unspecified technologies | |
| #7 | Pulse technique | |
| #8 | Semiconductor devices |
| # | Name | Total Patents |
|---|---|---|
| #1 | Van Kampen Robertus Petrus | 5 |
| #2 | Kazinczi Robert | 5 |
| #3 | Unamuno Anartz | 5 |
| #4 | Knipe Richard L | 5 |
| #5 | Gaddi Roberto | 4 |
| #6 | Renault Mickael | 4 |
| #7 | Joshi Vikram | 3 |
| #8 | Robert Kazinczi | 2 |
| #9 | Maguire Thomas L | 2 |
| #10 | Lacey Joseph Damian Gordon | 2 |
| Publication | Filing date | Title |
|---|---|---|
| CN103828050A | Merged legs and semi-flexible anchoring for MEMS device | |
| CN103889887A | MEMS device anchoring | |
| CN103732528A | Elimination of silicon residues from MEMS cavity floor | |
| CN103443020A | Method for increasing a sacrificial layer etching rate and device formed thereof | |
| GB0413341D0 | Arrangement and method for controlling a micromechanical element |