CANON NANOTECHNOLOGIES INC has a total of 63 patent applications. It decreased the IP activity by 100.0%. Its first patent ever was published in 2003. It filed its patents most often in EPO (European Patent Office), United States and China. Its main competitors in its focus markets optics, machines and micro-structure and nano-technology are MOLECULAR IMPRINTS INC, ITOH MASAMITSU and YONEDA IKUO.
# | Country | Total Patents | |
---|---|---|---|
#1 | EPO (European Patent Office) | 17 | |
#2 | United States | 10 | |
#3 | China | 8 | |
#4 | Republic of Korea | 8 | |
#5 | Singapore | 8 | |
#6 | WIPO (World Intellectual Property Organization) | 7 | |
#7 | Taiwan | 5 |
# | Industry | |
---|---|---|
#1 | Optics | |
#2 | Machines | |
#3 | Micro-structure and nano-technology | |
#4 | Semiconductors | |
#5 | Surface technology and coating | |
#6 | Textiles and paper |
# | Name | Total Patents |
---|---|---|
#1 | Choi Byung-Jin | 23 |
#2 | Xu Frank Y | 20 |
#3 | Sreenivasan Sidlgata V | 16 |
#4 | Ye Zhengmao | 14 |
#5 | Ganapathisubramanian Mahadevan | 12 |
#6 | Labrake Dwayne L | 12 |
#7 | Meissl Mario Johannes | 12 |
#8 | Cherala Anshuman | 11 |
#9 | Khusnatdinov Niyaz | 11 |
#10 | Bamesberger Seth J | 8 |
Publication | Filing date | Title |
---|---|---|
KR20160103020A | Asymmetric template shape modulation for partial field imprinting | |
WO2015103232A1 | Methods for uniform imprint pattern transfer of sub-20 nm features | |
CN105793777A | Scanning probe nanolithography system and method | |
KR20160084417A | Low contact imprint lithography template chuck system for improved overlay correction | |
TW201518859A | Drop pattern generation for imprint lithography with directionally-patterned templates | |
WO2014145634A2 | Nano imprinting with reusable polymer template with metallic or oxide coating | |
EP2227720A1 | High throughput imprint based on contact line motion tracking control | |
EP1838424A2 | Method for reducing adhesion forces between an imprinting material and a mold, and use of an imprinting composition |