AVC CO LTD has a total of 14 patent applications. Its first patent ever was published in 2003. It filed its patents most often in Japan, WIPO (World Intellectual Property Organization) and China. Its main competitors in its focus markets electrical machinery and energy, semiconductors and measurement are CIE D APPLIC MECANIQUES A L EL, HITACHI HIGH TECH CORP and MARCONI APPLIED TECHN LTD.
# | Country | Total Patents | |
---|---|---|---|
#1 | Japan | 7 | |
#2 | WIPO (World Intellectual Property Organization) | 4 | |
#3 | China | 2 | |
#4 | Republic of Korea | 1 |
# | Industry | |
---|---|---|
#1 | Electrical machinery and energy | |
#2 | Semiconductors | |
#3 | Measurement | |
#4 | Audio-visual technology | |
#5 | Optics |
# | Technology | |
---|---|---|
#1 | Semiconductor devices | |
#2 | Electric discharge tubes | |
#3 | Analysing materials | |
#4 | Lighting device details | |
#5 | Cameras | |
#6 | Television |
# | Name | Total Patents |
---|---|---|
#1 | Sasaki Tomoaki | 13 |
#2 | Chiba Akio | 13 |
#3 | Kawamura Masami | 6 |
#4 | Sekino Hiroyuki | 4 |
#5 | Kashiwabara Sadao | 2 |
#6 | Wakayama Yutaka | 1 |
#7 | Suzuki Satoshi | 1 |
#8 | Zhiyuan Lin | 1 |
#9 | Baihao Zhang | 1 |
#10 | Wenhao Liu | 1 |
Publication | Filing date | Title |
---|---|---|
JP2014215279A | Material transportation device | |
JP2014167394A | Four point resistance measurement instrument and four point measurement probe | |
JP2012227009A | Reflection high-energy electron diffraction method | |
JP2012227010A | Reflection high-energy electron diffraction apparatus | |
JP2012190824A | Vacuum feedthrough | |
JP2012059538A | Lighting fixture for vacuum device | |
JP2010053390A | Vapor guide tube | |
CN1611794A | Fan mechanism |