Electrodeless plasma light source with non-rotating light source
DE102017008001A1
High-frequency impedance matching network, its use, as well as a method of high-frequency impedance matching
WO2016162380A1
High-frequency tube cathode
DE102015105196A1
High-frequency tube cathode
DE102014116819A1
Method and arrangement for the dielectric heating of plastic pipes
DE102014116818A1
Method and arrangement for high frequency heating of plastic pipes with plasma electrode
DE10147851A1
Matching network with integrated low pass filter has parallel capacitors, series coil, adjustable series capacitor, parallel coil, optional series coil and adjustable series capacitor
DE10146111A1
Coating substrates by cathode atomization involves using diode cathodes supplied with high frequency energy at suitable selected or variable frequency on falling leg of self-bias curve
DE10115241A1
Plasma torch for treating surfaces at atmospheric pressure includes a jet pump within torch to provide low pressure region
DE19944631A1
Unit for treating hollow body in vacuum recipient is useful for sterilization and/or surface modification, e.g. of plastics or glass bottle for food, cosmetics or pharmaceuticals
DE19941542A1
Automatic tuning method and device for HF impedance matching network for plasma process uses cyclic measurement of electrical parameters and adjustment of tuning components in alternation
DE19939600A1
Arrangement for treatment of substrates e.g. wafers during the finishing of electronic and microelectronic components comprises substrate support plates arranged over each other in a vacuum chamber
DE19918790A1
High frequency electrical transmission, for use with high frequency generator, e.g. 13.56 MHz, includes a waveguide in the transfer path such that the high frequency is transferred in the form of helical waves
DE19902714A1
Structured coating process used in metallizing processes comprises applying a material to a substrate, covering the substrate and the material with a coating and then removing the material together with the coating
DE19857979A1
Vacuum chamber for drying, melting, surface treatment, PVD and CVD coating, etching and other plasma processes comprises functional units flange-connected to frame structure of interlocked profiles
DE19826297A1
Apparatus and method for avoiding arcing by active arc suppression during sputtering