SKION CORP has a total of 17 patent applications. Its first patent ever was published in 1997. It filed its patents most often in United States, WIPO (World Intellectual Property Organization) and Australia. Its main competitors in its focus markets electrical machinery and energy, chemical engineering and surface technology and coating are EMD CORP, DYNAMIC SOLAR DESIGN CO LTD and AURION ANLAGENTECHNIK GMBH.
# | Country | Total Patents | |
---|---|---|---|
#1 | United States | 7 | |
#2 | WIPO (World Intellectual Property Organization) | 4 | |
#3 | Australia | 1 | |
#4 | China | 1 | |
#5 | EPO (European Patent Office) | 1 | |
#6 | Japan | 1 | |
#7 | Republic of Korea | 1 | |
#8 | Taiwan | 1 |
# | Technology | |
---|---|---|
#1 | Electric discharge tubes | |
#2 | Plasma technique | |
#3 | Coating metallic material | |
#4 | Object sterilising | |
#5 | Semiconductor devices | |
#6 | Display controls | |
#7 | Unspecified technologies | |
#8 | Air-conditioning | |
#9 | Climate change adaptation technologies | |
#10 | Cleaning |
# | Name | Total Patents |
---|---|---|
#1 | Kim Steven | 10 |
#2 | Kim Seong I | 5 |
#3 | Yu Dong Woo | 4 |
#4 | Sohn Minho | 2 |
#5 | Lee Do Haing | 2 |
#6 | Steven Kim | 2 |
#7 | Yum Kun Yung | 1 |
#8 | Kim Seungdeok | 1 |
#9 | Yeom Geun Young | 1 |
#10 | Song Seok-Kyun | 1 |
Publication | Filing date | Title |
---|---|---|
US2003015505A1 | Apparatus and method for sterilization of articles using capillary discharge atmospheric plasma | |
US2002187066A1 | Apparatus and method using capillary discharge plasma shower for sterilizing and disinfecting articles | |
US2002139659A1 | Method and apparatus for sterilization of fluids using a continuous capillary discharge atmospheric pressure plasma shower | |
US2002122896A1 | Capillary discharge plasma apparatus and method for surface treatment using the same | |
AU2913901A | Multi wafer introduction/single wafer conveyor mode processing system and methodof processing wafers using the same | |
KR20020003709A | Field Emission Display Device and Method for fabricating the same | |
TW499495B | Magnetron negative ion sputter source | |
US5908699A | Cold cathode electron emitter and display structure |