| # | Country | Total Patents | |
|---|---|---|---|
| #1 | Japan | 6 | |
| #2 | United States | 4 | |
| #3 | Germany | 1 | |
| #4 | France | 1 | |
| #5 | United Kingdom | 1 | |
| #6 | Netherlands | 1 |
| # | Industry | |
|---|---|---|
| #1 | Semiconductors | |
| #2 | Surface technology and coating | |
| #3 | Thermal processes | |
| #4 | Computer technology | |
| #5 | Basic communication technologies | |
| #6 | Chemical engineering | |
| #7 | Machines |
| # | Technology | |
|---|---|---|
| #1 | Semiconductor devices | |
| #2 | Single-crystal-growth | |
| #3 | Details of furnaces | |
| #4 | Static stores | |
| #5 | Furnaces | |
| #6 | Pulse technique | |
| #7 | Unspecified technologies | |
| #8 | Drying solid materials by removing liquid |
| # | Name | Total Patents |
|---|---|---|
| #1 | Toole Monte M | 3 |
| #2 | Klein Raphael | 3 |
| #3 | Bowers Gerald M | 1 |
| #4 | Jierarudo Emu Bowaazu | 1 |
| #5 | Jieemuzu Jiyan Hiyuu | 1 |
| #6 | Suteiibun Jiei Shiyuuman | 1 |
| #7 | Champagne Robert B | 1 |
| #8 | Jiyon Wai Fuan | 1 |
| #9 | Monte Morudekai Touuru | 1 |
| #10 | Rafuaeru Kurein | 1 |
| Publication | Filing date | Title |
|---|---|---|
| JPS6096752A | Closing body and seal mechanism for high pressure oxydation furnace | |
| NL8303628A | Closure and seal construction for high-pressure oxidation furnace - protects silicon wafers being processed against contaminating out-gassing of elastomeric, and structural members of seal | |
| US4427378A | Closure and seal construction for high-pressure oxidation furnace and the like | |
| US4315479A | Silicon wafer steam oxidizing apparatus | |
| US4268538A | High-pressure, high-temperature gaseous chemical method for silicon oxidation | |
| US4167915A | High-pressure, high-temperature gaseous chemical apparatus |