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NL1005541C2
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Method for cooling an oven as well as an oven provided with a cooling device.
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NL1005410C2
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System for loading, handling and unloading substrates mounted on a support.
|
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NL1005102C2
|
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Device for treating semiconductor wafers.
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US5997588A
|
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Semiconductor processing system with gas curtain
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WO9709737A1
|
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Wafer support system
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US5573566A
|
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Method of making a quartz dome reactor chamber
|
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US5435682A
|
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Chemical vapor desposition system
|
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US5244694A
|
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Apparatus for improving the reactant gas flow in a reaction chamber
|
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US5175021A
|
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Transmission line for providing power to an electrode boat in a plasma enhanced chemical vapor deposition system
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US5091217A
|
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Method for processing wafers in a multi station common chamber reactor
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US4987856A
|
|
High throughput multi station processor for multiple single wafers
|
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EP0296804A2
|
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Process for epitaxial deposition of silicone
|
|
GB8613285D0
|
|
Nitrogen trifluoride as an in-situ cleaning agent
|
|
GB8531189D0
|
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Apparatus and method for transporting a workpiece
|
|
GB8531186D0
|
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Apparatus and method for transporting and orienting a workpiece
|
|
GB8531188D0
|
|
Apparatus and method for transporting a workpiece in a desired direction
|
|
GB8508320D0
|
|
Method and apparatus for cold runner transfer molding
|
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US4746856A
|
|
Semiconductor testing and apparatus therefor
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|
US4669599A
|
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Apparatus and method for handling a workpiece
|
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US4610748A
|
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Apparatus for processing semiconductor wafers or the like
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