| # | Country | Total Patents | |
|---|---|---|---|
| #1 | United States | 13 | |
| #2 | Republic of Korea | 7 |
| # | Industry | |
|---|---|---|
| #1 | Semiconductors | |
| #2 | Surface technology and coating | |
| #3 | Electrical machinery and energy | |
| #4 | Machines | |
| #5 | Measurement | |
| #6 | Chemical engineering | |
| #7 | Thermal processes | |
| #8 | Mechanical elements |
| # | Technology | |
|---|---|---|
| #1 | Semiconductor devices | |
| #2 | Electric discharge tubes | |
| #3 | Coating metallic material | |
| #4 | Unspecified technologies | |
| #5 | Single-crystal-growth | |
| #6 | Details of furnaces | |
| #7 | Measuring light | |
| #8 | Pipes | |
| #9 | Measuring temperature | |
| #10 | Plasma technique |
| # | Name | Total Patents |
|---|---|---|
| #1 | Ni Tuqiang | 8 |
| #2 | Zuo Rason | 4 |
| #3 | Du Zhiyou | 4 |
| #4 | Wu Dee | 4 |
| #5 | Yang Ping | 3 |
| #6 | Wan Lei | 3 |
| #7 | He Xiaoming | 3 |
| #8 | Liu Yingbin | 3 |
| #9 | Rin Sha | 2 |
| #10 | Shi Gang | 2 |
| Publication | Filing date | Title |
|---|---|---|
| KR20160129727A | A Chemical Vapor Deposition Apparatus and Its Cleaning Method |