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EVATEC AG

Overview
  • Total Patents
    205
  • GoodIP Patent Rank
    8,067
  • Filing trend
    ⇧ 2.0%
About

EVATEC AG has a total of 205 patent applications. It increased the IP activity by 2.0%. Its first patent ever was published in 2001. It filed its patents most often in Taiwan, WIPO (World Intellectual Property Organization) and EPO (European Patent Office). Its main competitors in its focus markets surface technology and coating, semiconductors and electrical machinery and energy are ADVANCED MICRO-FABRICATION EQUIPMENT INC SHANGHAI, COBRAIN NV and CANON ANELVA CORP.

Patent filings per year

Chart showing EVATEC AGs patent filings per year from 1900 to 2020

Top inventors

# Name Total Patents
#1 Weichart Juergen 32
#2 Weichart Jürgen 28
#3 Weichart Jurgen 27
#4 Bless Martin 24
#5 Rohrmann Hartmut 23
#6 Weichart Johannes 22
#7 Voser Stephan 20
#8 Balon Frantisek 17
#9 Felzer Heinz 16
#10 Benz Rico 14

Latest patents

Publication Filing date Title
WO2021078442A1 Vacuum process treatment chamber and method of treating a substrate by means of a vacuum treatment process
WO2021069167A1 Substrate support unit, and apparatus and method for depositing a layer using the same
WO2021013660A1 Piezoelectric coating and deposition process
WO2020178080A1 Method for processing fragile substrates employing temporary bonding of the substrates to carriers
WO2020161139A2 Method of producing ions and apparatus
WO2020126910A1 Vacuum treatment apparatus and method for vacuum plasma treating at least one substrate or for manufacturing a substrate
WO2020126175A1 Vacuum system and method to deposit a compound layer
WO2020083882A1 Liquid sputter target
WO2020074248A1 Vacuum treatment apparatus and method of vacuum treating substrates
WO2020069901A1 Plasma enhanced atomic layer deposition (peald) apparatus
WO2020083576A1 Deposition process for piezoelectric coatings
WO2020035478A1 Method and apparatus for low particle plasma etching
WO2020038660A1 Vacuum processing apparatus
EP3794633A1 Substrate vacuum treatment apparatus and method therefore
EP3794157A1 Method of treating a substrate and vacuum deposition apparatus
WO2019162041A1 Stabilizing stress in a layer with respect to thermal loading
EP3718132A1 Substrate processing apparatus and method of processing a substrate and of manufacturing a processed workpiece
WO2019105671A1 Evaporation chamber and system
TW201927079A Rf power delivery to vacuum plasma processing
WO2019096515A1 Vacuum treatment apparatus and method of vacuum treating substrates