ZEISS CARL MICROELECTRONIC SYS has a total of 30 patent applications. Its first patent ever was published in 2002. It filed its patents most often in WIPO (World Intellectual Property Organization), EPO (European Patent Office) and Germany. Its main competitors in its focus markets optics, measurement and engines, pumps and turbines are SHANGHAI NEXTREND TECHNOLOGY CO LTD, HILL HENRY ALLEN and LEICA MICROSYSTEMS.
# | Country | Total Patents | |
---|---|---|---|
#1 | WIPO (World Intellectual Property Organization) | 14 | |
#2 | EPO (European Patent Office) | 9 | |
#3 | Germany | 5 | |
#4 | United States | 2 |
# | Industry | |
---|---|---|
#1 | Optics | |
#2 | Measurement | |
#3 | Engines, pumps and turbines | |
#4 | Machines |
# | Name | Total Patents |
---|---|---|
#1 | Bischoff Joerg | 11 |
#2 | Engel Thomas | 9 |
#3 | Steiner Reinhard | 6 |
#4 | Menck Alexander | 6 |
#5 | Burkhardt Matthias | 5 |
#6 | Scheruebl Thomas | 5 |
#7 | Erdmann Lars | 5 |
#8 | Czarnetzki Norbert | 5 |
#9 | Dobschal Hans-Juergen | 5 |
#10 | Harnisch Wolfgang | 4 |
Publication | Filing date | Title |
---|---|---|
US2004012847A1 | Displaceable optics in microscope illumination, particularly displaceable collector | |
DE10245231A1 | Arrangement for reducing coherence | |
DE10245229A1 | Arrangement for reducing the coherence of a light beam | |
DE10220815A1 | Reflective X-ray microscope e.g. for microlithography, includes additional subsystem arranged after first subsystem along beam path and containing third mirror | |
DE10220816A1 | Reflective X-ray microscope for examining an object in an object plane illuminates the object with beam wavelengths less than 30 nm while scanning it into an image plane as an enlarged object | |
DE10201315A1 | coherence-reducing |