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WI SOON IM

Overview
  • Total Patents
    125
  • GoodIP Patent Rank
    208,208
About

WI SOON IM has a total of 125 patent applications. Its first patent ever was published in 2002. It filed its patents most often in Republic of Korea. Its main competitors in its focus markets electrical machinery and energy, semiconductors and chemical engineering are CHOI DAI KYU, RADIION TECH CO LTD and WINTEL CO LTD.

Patent filings in countries

World map showing WI SOON IMs patent filings in countries
# Country Total Patents
#1 Republic of Korea 125

Patent filings per year

Chart showing WI SOON IMs patent filings per year from 1900 to 2020

Top inventors

# Name Total Patents
#1 Wi Soon Im 125
#2 Choi Dai Kyu 16
#3 Jo Mi Ra 1

Latest patents

Publication Filing date Title
KR20160130959A Remote plasma generator having plug-in type rf generator module
KR20150113946A Gate valve assembly for wafer processing system
KR20160080597A Remote plasma generator having plug-in type rf generator module
KR101272778B1 Heating appatatus with multi winding carbon fiber
KR20120061373A Infrared touch screen devices
KR101128877B1 Gate valve device for wafer processing system
KR20120055376A Multi-functional laminated plate having carbon nanotube
KR20120054694A Apparatus for maunfacturing carbon fiber
KR20120053546A Touchscreen device using carbon fiber
KR20120052798A Carbon fiber strand assembly and production method thereof and production apparatus
KR20120051530A Production method of carbon fiber mesh and carbon fiber mesh thereof
KR20120037044A Apparatus for maunfacturing carbon fiber using electrode
KR20120037042A Apparatus for maunfacturing carbon fiber using plasma source
KR20120037043A Apparatus for maunfacturing carbon fiber using plasma source
KR20120037041A Apparatus for maunfacturing carbon fiber using plasma source
KR20120034874A Touch screen device using vibrating optical reflector
KR20120004566A Light guide panel assembly having thermal damage absorbers member
KR20110136042A Pattern wet etching apparatus for light guide plate
KR20110136043A Pattern wet etching apparatus for light guide plate
KR20110090132A Plasma reactor have a variable capacitively coupled plasma