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VEECO INSTR INC

Overview
  • Total Patents
    866
  • GoodIP Patent Rank
    6,417
  • Filing trend
    ⇩ 53.0%
About

VEECO INSTR INC has a total of 866 patent applications. It decreased the IP activity by 53.0%. Its first patent ever was published in 1961. It filed its patents most often in United States, WIPO (World Intellectual Property Organization) and EPO (European Patent Office). Its main competitors in its focus markets surface technology and coating, semiconductors and measurement are CVC INC, CVC PRODUCTS INC and GENUS INC.

Patent filings per year

Chart showing VEECO INSTR INCs patent filings per year from 1900 to 2020

Top inventors

# Name Total Patents
#1 Armour Eric A 94
#2 Mitrovic Bojan 72
#3 Quinn William E 72
#4 Krishnan Sandeep 63
#5 Gurary Alexander I 60
#6 Boguslavskiy Vadim 49
#7 Belousov Mikhail 42
#8 Paranjpe Ajit 41
#9 Gurary Alex 40
#10 Gurary Alexander 39

Latest patents

Publication Filing date Title
WO2021077100A1 Molecular beam epitaxy systems with variable substrate-to-source arrangements
WO2021007585A1 Melt detection systems and methods of using the same
US2020354828A1 Deposition system with integrated carrier cleaning modules
US2021095374A1 CVD Reactor Single Substrate Carrier and Rotating Tube for Stable Rotation
WO2020172244A1 Automated batch production thin film deposition systems and methods of using the same
US2020161146A1 Semiconductor wafer processing chamber
US2019393069A1 Micro-LED transfer methods using light-based debonding
WO2019246366A1 Micro-led transfer methods using light-based debonding
WO2019200312A1 Chemical vapor deposition apparatus with multi-zone injector block
US2019301012A1 Wafer processing system with flow extender
US2019259559A1 Plasma bridge neutralizer for ion beam etching
US2020083075A1 System and method for metrology using multiple measurement techniques
US2020063287A1 Chemical vapor deposition wafer carriers
US2020056284A1 Chemical vapor deposition wafer carriers
US2019035682A1 Laser-based systems and methods for melt-processing of metal layers in semiconductor manufacturing
US2019295880A1 Chemical vapor deposition wafer carrier with thermal cover
CN110088876A The thickness uniformity of epitaxial growth structure is controlled in chemical gas-phase deposition system
US2019091616A1 Filter element for wafer processing assembly
SG10201705059TA Enhanced cathodic arc source for arc plasma deposition
US2017362701A1 Central source delivery for chemical vapor deposition systems