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VALCORE JR JOHN C

Overview
  • Total Patents
    15
About

VALCORE JR JOHN C has a total of 15 patent applications. Its first patent ever was published in 2009. It filed its patents most often in United States. Its main competitors in its focus markets electrical machinery and energy, chemical engineering and measurement are YAMAZAWA YOHEI, METAL PROCESS SARL and PLASMION.

Patent filings in countries

World map showing VALCORE JR JOHN Cs patent filings in countries
# Country Total Patents
#1 United States 15

Patent filings per year

Chart showing VALCORE JR JOHN Cs patent filings per year from 1900 to 2020

Top inventors

# Name Total Patents
#1 Valcore Jr John C 15
#2 Lyndaker Bradford J 8
#3 Santos Ed 2
#4 Byun Daniel 1
#5 Povolny Henry S 1
#6 Fong Andrew S 1
#7 Makhratchev Konstantin 1
#8 Rogers James 1
#9 Ullal Saurabh 1
#10 Singh Harmeet 1

Latest patents

Publication Filing date Title
US2014214350A1 Using modeling to determine wafer bias associated with a plasma system
US2014197731A1 Tuning a parameter associated with plasma impedance
US2014172335A1 Determining a value of a variable on an RF transmission model
US2014173158A1 Optimizing a rate of transfer of data between an RF generator and a host system within a plasma tool
US2013214683A1 Impedance-based adjustment of power and frequency
US2014076713A1 Edge ramping
US2013213573A1 State-based adjustment of power and frequency
US2013214828A1 Methods and apparatus for synchronizing RF pulses in a plasma processing system
US2013213934A1 Methods and apparatus for controlling plasma in a plasma processing system
US2011137446A1 Plasma processing system control based on RF voltage
US2011115492A1 Methods and apparatus for detecting the confinement state of plasma in a plasma processing system
US2011060442A1 Methods and arrangement for detecting a wafer-released event within a plasma processing chamber
US2011058302A1 Methods and arrangement for plasma dechuck optimization based on coupling of plasma signaling to substrate position and potential
US2011011730A1 System and method for plasma arc detection, isolation and prevention