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UTEC KK

Overview
  • Total Patents
    98
About

UTEC KK has a total of 98 patent applications. Its first patent ever was published in 1991. It filed its patents most often in Japan. Its main competitors in its focus markets surface technology and coating, semiconductors and electrical machinery and energy are NANOFILM TECHNOLOGIES INT, CHIANG TONY P and OERLIKON ADVANCED TECHNOLOGIES AG.

Patent filings in countries

World map showing UTEC KKs patent filings in countries
# Country Total Patents
#1 Japan 98

Patent filings per year

Chart showing UTEC KKs patent filings per year from 1900 to 2020

Top inventors

# Name Total Patents
#1 Honda Yuji 39
#2 Fujiwara Hidetoshi 26
#3 Suzuki Mitsuhiro 14
#4 Sato Kazumitsu 10
#5 Kijima Takeshi 8
#6 Kobayashi Takumi 8
#7 Hayakawa Haruhito 7
#8 Kawabe Takeharu 6
#9 Youzen Shinichi 6
#10 Shirato Takeshi 4

Latest patents

Publication Filing date Title
JP2013083006A Metal plate, and film deposition method of osmium film
JP2013090888A Golf club
JP2013052204A Twisting power correction device for golf club
JP2011155269A Pressurization type lamp anneal device
JP2011089213A Facing target sputtering apparatus and facing target sputtering method
JP2010270144A Microcapsules and process for production of the same
JP2011176028A Pressurizing-type lamp annealing device, method for manufacturing thin film, and method for using pressurizing-type lamp annealing device
JP2011169011A Snow-melting water spray nozzle
JP2011124441A Method for manufacturing crystallized film and crystallization apparatus
JP2011114141A Piezoelectric substance and piezoelectric element
JP2009256804A Fine particle
JP2011029394A Pzt film, electronic component, method of manufacturing oxide material film, and steam pressure rapid heating device
JP2011029399A Ferroelectric film, electronic component, and method of manufacturing the ferroelectric film
JP2010121159A Roller-type plasma cvd apparatus, and roller-type plasma apparatus
JP2010059667A Snow melting block and method of manufacturing the same
JP2010053402A Film-forming apparatus, and method for manufacturing substrate for forming oxide thin film thereon
JP2010036152A Reactor and reaction method
JP2010013676A Plasma cvd apparatus, dlc film, and method for producing thin film
JP2010013675A Plasma cvd apparatus, method for producing thin film, and method for manufacturing magnetic recording medium
JP2010007126A Plasma cvd system and method for producing magnetic recording medium