Method for producing lead zirconium titanate-based sintered body, lead zirconium titanate-based sintered body, and lead zirconium titanate-based sputtering target
JP2009046340A
Method for producing lithium phosphate sintered compact, and sputtering target
JP2009007626A
Method for producing aluminum-lithium alloy target, and aluminum-lithium alloy target
JP2008279317A
Deposit removing device/method
JP2007302996A
Ta SPUTTERING TARGET AND METHOD FOR PRODUCING THE SAME
JP2008195554A
Ito sintered compact, ito sputtering target and its manufacturing method
JP2008095132A
Device component for vacuum film deposition device, etching device or the like, method for producing the same, and method for reproducing the same
JP2007297683A
Magnet assembly, instrument for measuring magnetic leakage flux by using the magnet assembly, method for measuring magnetic leakage flux, and testing method
JP2007297679A
Sputtering target of cobalt and manufacturing method therefor
JP2007297654A
Sputtering target, joint type sputtering target and method for producing the same
JP2007055055A
Mold, plate-shaped sintered body, method for producing the sintered body, sputtering target, and method for producing sputtering target
JP2005330158A
Method for manufacturing complex oxide sintered body, and sputtering target composed of its sintered body
JP2005248296A
Component for film deposition apparatus and film deposition apparatus