Oxide sputtering target and transparent conductive film deposited by the same
KR20150120073A
Method of fabricating indium zinc oxide sputtering target
KR20150104682A
Oxide sputtering target
KR20150066037A
ZnO BASED SPUTTERING TARGET, OLED HAVING TRANSPARENT ELECTRODE DEPOSITED BY THE SAME AND METHOD OF FABRICATING THEREOF
KR20150059965A
Carriage for sintering furnace
KR101458993B1
Zinc oxide based transparent conductive film for photovoltaic and photovoltaic including the same
KR20150025004A
Method of fabricating sputtering target
US2013320336A1
Oxide semiconductor sputtering target, method of manufacturing thin-film transistors using the same, and thin film transistor manufactured using the same
KR20140140187A
ZnO BASED SPUTTERING TARGET AND PHOTOVOLTAIC CELL HAVING PASSIVATION LAYER DEPOSITED BY THE SAME
KR20140126445A
Device and method for coating a inner surface of a target
KR20140106813A
ZnO BASED SPUTTERING TARGET, METHOD OF FABRICATING THEREOF AND THIN FILM TRANSISTOR HAVING SHIELDING LAYER DEPOSITED BY THE SAME
KR20140093048A
Indium tin oxide sputtering target, transparenrt conductive film manufactured by thereof, manufacturing method of the transparenrt conductive film, and display device compring the transparenrt conductive film
KR20140090452A
Indium oxide based sputtering target containing gallium oxide and germanium oxide, thin film transistor using the same, and display device comprising the thin film transistor
KR20140079050A
Method for recovering indium tin oxide power and method for manufacturing indium tin oxide target using the same
