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KOBELCO KAKEN:KK

Overview
  • Total Patents
    37
  • GoodIP Patent Rank
    69,729
  • Filing trend
    ⇩ 100.0%
About

KOBELCO KAKEN:KK has a total of 37 patent applications. It decreased the IP activity by 100.0%. Its first patent ever was published in 2009. It filed its patents most often in Japan. Its main competitors in its focus markets environmental technology, surface technology and coating and materials and metallurgy are KOBELCO KAKEN KK, KOBELCO RES INST INC and KOBELCO RES INSTITUTE INC.

Patent filings in countries

World map showing KOBELCO KAKEN:KKs patent filings in countries
# Country Total Patents
#1 Japan 37

Patent filings per year

Chart showing KOBELCO KAKEN:KKs patent filings per year from 1900 to 2020

Top inventors

# Name Total Patents
#1 Ido Hidekazu 6
#2 Yoshida Shintaro 6
#3 Nishiuchi Masato 5
#4 Tsubota Takayuki 4
#5 Okuno Hiroyuki 4
#6 Nakane Yasuo 3
#7 Kohori Takashi 3
#8 Matsubara Tomoyuki 3
#9 Hayashi Yoshiki 3
#10 Tao Koki 3

Latest patents

Publication Filing date Title
JP2017193477A Oxide sintered body and sputtering target, and methods for producing same
JP2017193478A Oxide sintered body and sputtering target, and methods for producing same
JP2017181212A Method and device for analyzing generated gas in power storage device
JP2017137549A Ultraviolet reflection film, and sputtering target
JP2017139381A Wiring structure for display device
JP2017135149A Wiring structure and sputtering target
JP2017096678A Eddy current flaw detection probe for detecting thinned state of ground contact portion of object to be inspected and method for detecting reduction in thickness using eddy current flaw detection probe
JP2017090272A Shape measurement method and shape measurement device
JP2017091804A Method for analyzing lithium ion concentration distribution in lithium ion secondary battery electrode, and cell for evaluation
JP2017075377A LiCoO2-CONTAINING SINTERED BODY, LiCoO2-CONTAINING SPUTTERING TARGET, AND PRODUCTION METHOD OF LiCoO2-CONTAINING SINTERED BODY
JP2017068219A Electrode structure
JP2017031475A Aluminum sputtering target
JP2017019668A Oxide sintered body and sputtering target and manufacturing method therefor
JP2017014562A Sputtering target assembly
JP2017015490A Apparatus and method for measuring suspended matter content
JP2017002343A Al alloy sputtering target
JP2016217991A Thickness reduction inspection method
JP2016207425A Sample table for observation
JP2016149401A Hybrid capacitor
JP2016051683A Secondary battery, and method for measuring gas generated in secondary battery