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ULTRATECH INC

Overview
  • Total Patents
    515
  • GoodIP Patent Rank
    5,860
  • Filing trend
    ⇩ 33.0%
About

ULTRATECH INC has a total of 515 patent applications. It decreased the IP activity by 33.0%. Its first patent ever was published in 1996. It filed its patents most often in United States, Taiwan and Republic of Korea. Its main competitors in its focus markets semiconductors, optics and machine tools are JETEK INC, SEWOOINCORPORATION CO LTD and AP SYSTEMS INC.

Patent filings per year

Chart showing ULTRATECH INCs patent filings per year from 1900 to 2020

Top inventors

# Name Total Patents
#1 Hawryluk Andrew M 128
#2 Markle David A 49
#3 Wang Yun 46
#4 Talwar Somit 40
#5 Zafiropoulo Arthur W 39
#6 Anikitchev Serguei 36
#7 Andrew M Hawryluk 33
#8 Hawryluk M Andrew 26
#9 Serguei Anikitchev 24
#10 Sundaram Ganesh 22

Latest patents

Publication Filing date Title
US2018308758A1 Methods of Forming Sources and Drains for FinFETs Using Solid Phase Epitaxy With Laser Annealing
CN110225997A The chuck system and method for the electric isolution of enhancing with the ALD for substrate bias
US2018226535A1 Methods of Forming Product Wafers Having Semiconductor Light-Emitting Devices To Improve Emission Wavelength Uniformity
TW201831720A Methods of forming mld films using polyols with long carbon backbones
JP2018138990A Scanning methods for focus control for lithographic processing of reconstituted wafers
JP2018139284A Wafer chuck apparatus with contractible sealing devices for securing warped wafers
US2018122681A1 Wafer chuck apparatus with micro-channel regions
US2017260629A1 Quartz crystal microbalance assembly for ALD systems
US2017241019A1 Pe-ald methods with reduced quartz-based contamination
NL2017881A Full-wafer inspection methods having selectable pixel density
NL2017860A Systems and methods of characterizing process-induced wafer shape for process control using cgs interferometry
US2017114451A1 Methods of forming an ALD-inhibiting layer using a self-assembled monolayer
US2017088952A1 High-throughput multichamber atomic layer deposition systems and methods
US2017073812A1 Laser-assisted atomic layer deposition of 2D metal chalcogenide films
SG10201606973YA Plasma-enhanced atomic layer deposition system with rotary reactor tube
JP2017028270A Masking methods for ald processes for electrode-based devices
SG10201605683WA High-efficiency line-forming optical systems and methods using a serrated spatial filter
KR20160144307A Microchamber Laser Processing Systems and Methods Using Localized Process-Gas Atmosphere
US2016363440A1 Polarization-based coherent gradient sensing systems and methods
US2016354865A1 Microchamber laser processing systems and methods using localized process-gas atmosphere