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TRUMPF HUETTINGER SP Z O O

Overview
  • Total Patents
    52
  • GoodIP Patent Rank
    36,793
  • Filing trend
    ⇧ 100.0%
About

TRUMPF HUETTINGER SP Z O O has a total of 52 patent applications. It increased the IP activity by 100.0%. Its first patent ever was published in 2010. It filed its patents most often in EPO (European Patent Office), WIPO (World Intellectual Property Organization) and United States. Its main competitors in its focus markets electrical machinery and energy, measurement and basic communication technologies are ADVANCED ENERGY IND INC, HUTTINGER ELEKTRONIK GMBH & CO and ELECTRONS INC.

Patent filings per year

Chart showing TRUMPF HUETTINGER SP Z O Os patent filings per year from 1900 to 2020

Top inventors

# Name Total Patents
#1 Zelechowski Marcin 21
#2 Lach Piotr 20
#3 Klimczak Andrzej 16
#4 Ozimek Pawel 15
#5 Gieraltowski Andrzej 13
#6 Grabowski Adam 11
#7 Bugyi Rafal 10
#8 Golan Marcin 10
#9 Swiatnicki Jakub 8
#10 Ruda Krzysztof 8

Latest patents

Publication Filing date Title
EP3796362A1 Method of plasma processing a substrate in a plasma chamber and plasma processing system
EP3605115A1 Arc detector for detecting arcs, plasma system and method of detecting arcs
EP3605842A1 Balun and amplifier including the balun
EP3605582A1 Power converter and power supply system
EP3091559A1 Plasma impedance matching unit, system for supplying rf power to a plasma load, and method of supplying rf power to a plasma load
EP3054472A1 Arc treatment device and method therefor
EP3035365A1 Method of detecting an arc occurring during the power supply of a plasma process, control unit for a plasma power supply, and plasma power supply
US2014320015A1 Reducing stored electrical energy in a lead inductance
EP2905801A1 Method of monitoring the discharge in a plasma process and monitoring device for monitoring the discharge in a plasma
EP2905802A1 Method of detecting arcs in a plasma process and power supply for supplying an output quantity to a plasma process
KR20200071144A High-rate reactive sputtering of dielectric stoichiometric films
US2015206711A1 Apparatus for generating and maintaining plasma for plasma processing
EP2804454A1 Electrical cabinet and module for an electrical cabinet
DE102013202428A1 Power supply arrangement for powering industrial processes
EP2541584A1 Generating a highly ionized plasma in a plasma chamber
DE102010038603A1 Dc plasma arrangement