TEVET PROCESS CONTROL TECHNOLO

Overview

About

TEVET PROCESS CONTROL TECHNOLO has a total of 23 patent applications. Its first patent ever was published in 1998. It filed its patents most often in Australia, EPO (European Patent Office) and United States. Its main competitors in its focus markets measurement, optics and semiconductors are METRIS N V, SA08700334 and MARPOSS SOCIETA' PER AZIONI.

Patent filings in countries

#	Country	Total Patents
#1	Australia	4
#2	EPO (European Patent Office)	4
#3	United States	4
#4	WIPO (World Intellectual Property Organization)	4
#5	China	3
#6	Canada	1
#7	Israel	1
#8	Republic of Korea	1
#9	Norway	1

#	Technology
#1	Measuring length, angles and areas
#2	Photomechanical semiconductor production
#3	Measuring electric variables
#4	Semiconductor devices
#5	Control or regulating systems
#6	Climate change mitigation in goods production
#7	Analysing materials

#	Name	Total Patents
#1	Du-Nour Ofer	19
#2	Rubinstein Vladimir	5
#3	Ish-Shalom Yaron	4
#4	Du Nour Ofer	1
#5	Yaron Ish-Shalom	1
#6	Vladimir Du-Nour Ofer Rubinste	1
#7	Ofer Du-Nour	1

Publication	Filing date	Title
US2004080761A1	2002-10-28	Method and apparatus for thickness decomposition of complicated layer structures
US2003098704A1	2001-11-26	Method and apparatus for measuring stress in semiconductor wafers
US2003002032A1	2001-07-02	Method and apparatus for production line screening
IL125964D0	1998-08-27	Method and apparatus for measuring the thickness of a transparent film, particularly of a photoresist film on a semiconductor substrate