| # | Country | Total Patents | |
|---|---|---|---|
| #1 | Republic of Korea | 10 | |
| #2 | United States | 8 | |
| #3 | China | 6 | |
| #4 | Taiwan | 5 | |
| #5 | WIPO (World Intellectual Property Organization) | 3 | |
| #6 | Germany | 1 | |
| #7 | EPO (European Patent Office) | 1 | |
| #8 | Hong Kong | 1 | |
| #9 | Singapore | 1 |
| # | Industry | |
|---|---|---|
| #1 | Chemical engineering | |
| #2 | Optics | |
| #3 | Semiconductors | |
| #4 | Machines | |
| #5 | Electrical machinery and energy | |
| #6 | Basic materials chemistry | |
| #7 | Surface technology and coating | |
| #8 | Machine tools |
| # | Technology | |
|---|---|---|
| #1 | Cleaning | |
| #2 | Photomechanical semiconductor production | |
| #3 | Semiconductor devices | |
| #4 | Spraying devices | |
| #5 | Plasma technique | |
| #6 | Electric discharge tubes | |
| #7 | Processes for applying fluent materials | |
| #8 | Soaps | |
| #9 | Blasting |
| # | Name | Total Patents |
|---|---|---|
| #1 | Dietze Uwe | 36 |
| #2 | Samayoa Martin | 13 |
| #3 | Dress Peter | 12 |
| #4 | Singh Sherjang | 8 |
| #5 | Grabitz Peter | 8 |
| #6 | Dattilo Davide | 7 |
| #7 | Hichri Habib | 5 |
| #8 | Lee Seongkuk | 5 |
| #9 | Shende Hrishi | 4 |
| #10 | Hsu Jyh-Wei | 3 |
| Publication | Filing date | Title |
|---|---|---|
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| US2019247896A1 | Method and apparatus for cleaning a substrate and computer program product | |
| CN108348964A | For the liquid medium of UV radiations will to be utilized to be applied to the device on substrate | |
| CN108290185A | For the liquid medium of UV radiations will to be utilized to be applied to the device on substrate | |
| US2017271145A1 | Method and an apparatus for cleaning substrates | |
| US2017087585A1 | Method for treating substrates with an aqueous liquid medium exposed to uv-radiation | |
| DE102009058962A1 | Method and device for treating substrates |