| # | Country | Total Patents | |
|---|---|---|---|
| #1 | EPO (European Patent Office) | 9 | |
| #2 | Taiwan | 6 | |
| #3 | Russian Federation | 5 | |
| #4 | Hong Kong | 4 | |
| #5 | WIPO (World Intellectual Property Organization) | 4 | |
| #6 | China | 3 | |
| #7 | Germany | 3 | |
| #8 | Netherlands | 1 |
| # | Industry | |
|---|---|---|
| #1 | Optics | |
| #2 | Chemical engineering | |
| #3 | Semiconductors | |
| #4 | Machines | |
| #5 | Machine tools | |
| #6 | Basic materials chemistry | |
| #7 | Surface technology and coating | |
| #8 | Electrical machinery and energy |
| # | Technology | |
|---|---|---|
| #1 | Photomechanical semiconductor production | |
| #2 | Cleaning | |
| #3 | Semiconductor devices | |
| #4 | Spraying devices | |
| #5 | Blasting | |
| #6 | Soaps | |
| #7 | Processes for applying fluent materials | |
| #8 | Plasma technique | |
| #9 | Electric discharge tubes |
| # | Name | Total Patents |
|---|---|---|
| #1 | Dietze Uwe | 34 |
| #2 | Dress Peter | 15 |
| #3 | Grabitz Peter | 12 |
| #4 | Samayoa Martin | 8 |
| #5 | Singh Sherjang | 8 |
| #6 | Dattilo Davide | 7 |
| #7 | Beser Adem | 5 |
| #8 | Datilo Davide | 3 |
| #9 | Krumberg Jens | 3 |
| #10 | Krümberg Jens | 2 |
| Publication | Filing date | Title |
|---|---|---|
| TW201826016A | Apparatus and method for cleaning a partial area of a substrate | |
| DE102017203351A1 | Device for applying a liquid medium exposed to UV radiation to a substrate | |
| NL2017806B1 | Holder for receiving and protecting one side of a photomask or of a photomask with pellicle from a cleaning medium, method for cleaning a photomask or a photomask with pellicle and apparatus for opening and closing a holder | |
| DE102015011229A1 | Device for applying a liquid medium exposed to UV radiation to a substrate | |
| DE102012008220A1 | Method for cleaning photomasks using megasonic |