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SHENZHEN NEWWAY PHOTOMASK MAKING CO LTD

Overview
  • Total Patents
    16
  • GoodIP Patent Rank
    103,879
  • Filing trend
    ⇧ 100.0%
About

SHENZHEN NEWWAY PHOTOMASK MAKING CO LTD has a total of 16 patent applications. It increased the IP activity by 100.0%. Its first patent ever was published in 2014. It filed its patents most often in China. Its main competitors in its focus markets optics, chemical engineering and basic materials chemistry are SASU VIANORD ENG, LAFARRE RAYMOND WILHELMUS LOUIS and JIANGSU JIUDI LASER EQUIPMENT TECH CO LTD.

Patent filings in countries

World map showing SHENZHEN NEWWAY PHOTOMASK MAKING CO LTDs patent filings in countries
# Country Total Patents
#1 China 16

Patent filings per year

Chart showing SHENZHEN NEWWAY PHOTOMASK MAKING CO LTDs patent filings per year from 1900 to 2020

Top inventors

# Name Total Patents
#1 Du Wubing 16
#2 Lin Wei 15
#3 Lyu Zhenqun 5
#4 Huang Guoyong 2
#5 Sun Duowei 2
#6 Jiang Lingfei 2
#7 Si Jiwei 2
#8 Feng Jun 1
#9 Zheng Yuchen 1

Latest patents

Publication Filing date Title
CN111515764A Method for repairing surface defects of micro-area of glass substrate
CN111438133A Chromium plate cleaning jig and cleaning method
CN109739072A Light shield exposal control method
CN109471335A Chromium plate patch jig and method
CN109634051A Intermediate tone mask version wet ashing production method
CN109254493A Intermediate tone mask version production method
CN109433663A Mask plate processing procedure tub cleaning method
CN108196421A Gray level mask plate production method
CN106842812A Antistatic mask plate former material, antistatic mask plate and preparation method thereof
CN105954984A Photomask development impregnating compound and photomask development method
CN106094449A Dry plate abluent and dry plate cleaning method
CN105838507A Photomask cleaning agent and method
CN105045047A Circular-ring-piece-shaped chromium plate exposure fixture and exposure method
CN104570583A Parameter optimization method in photomask manufacturing process
CN104460239A Manufacturing method of photomask sub-plate with code
CN104375394A Etching liquor and mask plate forming method