| # | Country | Total Patents | |
|---|---|---|---|
| #1 | Republic of Korea | 5 | |
| #2 | United States | 5 | |
| #3 | EPO (European Patent Office) | 4 | |
| #4 | WIPO (World Intellectual Property Organization) | 3 | |
| #5 | China | 2 | |
| #6 | Japan | 2 |
| # | Industry | |
|---|---|---|
| #1 | Semiconductors | |
| #2 | Audio-visual technology | |
| #3 | Telecommunications | |
| #4 | Digital networks | |
| #5 | Computer technology |
| # | Technology | |
|---|---|---|
| #1 | Semiconductor devices | |
| #2 | Television | |
| #3 | Electric digital data processing | |
| #4 | Wireless communication networks | |
| #5 | Digital information transmission |
| # | Name | Total Patents |
|---|---|---|
| #1 | Na Yeul | 21 |
| #2 | Kim Youngsik | 19 |
| #3 | Lee Jae Hyung | 17 |
| #4 | Jung Woo-Shik | 12 |
| #5 | Jung Woo Shik | 7 |
| #6 | Lee Jae-Hyung | 4 |
| #7 | Lee Jin Hyung | 3 |
| #8 | Kim Young-Sik | 2 |
| #9 | Jung Wooshik | 1 |
| #10 | Jung Woo-Shi | 1 |
| Publication | Filing date | Title |
|---|---|---|
| US9378950B1 | Methods for removing nuclei formed during epitaxial growth | |
| KR20170096134A | Reduction of surface roughness in epitaxially grown germanium by controlled thermal oxidation | |
| KR20160021289A | Gate-controlled Charge Modulated Device for CMOS Sensors |