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FINE SOLUTION CO LTD

Overview
  • Total Patents
    27
  • GoodIP Patent Rank
    76,869
  • Filing trend
    ⇩ 66.0%
About

FINE SOLUTION CO LTD has a total of 27 patent applications. It decreased the IP activity by 66.0%. Its first patent ever was published in 2008. It filed its patents most often in Republic of Korea, WIPO (World Intellectual Property Organization) and China. Its main competitors in its focus markets electrical machinery and energy, surface technology and coating and machine tools are NORDIKO TECHNICAL SERVICES LTD, WHITE NICHOLAS R and KOVTOUN VIATCHESLAV V.

Patent filings in countries

World map showing FINE SOLUTION CO LTDs patent filings in countries

Patent filings per year

Chart showing FINE SOLUTION CO LTDs patent filings per year from 1900 to 2020

Top inventors

# Name Total Patents
#1 Hwang Yun Seok 25
#2 Huh Yun Sung 22
#3 Ko Jung Gon 4
#4 Huh Yun-Sung 1
#5 Yoo Dae Jin 1
#6 Hwang Yun-Seok 1

Latest patents

Publication Filing date Title
KR20200134826A Ion Milling and Sputtering Apparatus
KR20200048321A Apparatus for Collecting Infrared Ray
KR101677005B1 Plasma Processing Appratus of Controlling Electric Charge
KR20160030868A Ion Source with Facing Electrodes
KR20150093140A Slanted Single-loop Ion SourceIon, Ion Beam Processing Apparatus and Ion Beam Sputtering Apparatus therewith
CN106663578A Ion source
KR20160111812A Patch-typed Nail Polisher
KR101560286B1 Tape for separation and removal of optically clear adhesive on cover glass or panel in process of recycling of touch screen panel, method for preparing the same and method for separation and removal of optically clear adhesive on cover glass or panel in process of recycling of touch screen panel using the tape
KR20160088754A Nail Polisher
KR20160030618A Ion Source with Facing Electrodes
KR20160030012A Ion Source and Deposition Apparatus therewith
KR20160014222A Ion Source
KR20140145568A Ion Source
WO2014175702A1 Ion beam source
KR20150116245A Ion Source with Gas Ejection Part in Anode
KR20150050070A Slanted Ion Source, Ion Beam Processing Apparatus and Ion Beam Sputtering Apparatus therewith
KR20140145287A Ion Source using Internal Process Gas
KR20140132520A Mask for Manufacturing OLED and Method thereof
KR20140128140A Multi-Loop End-Hall Ion Source and Ion Beam Processing Apparatus therewith
KR101440771B1 Electrical Power Supply for Sputter