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SOLTEC KK

Overview
  • Total Patents
    41
About

SOLTEC KK has a total of 41 patent applications. Its first patent ever was published in 1991. It filed its patents most often in Japan. Its main competitors in its focus markets optics and chemical engineering are LOF JOERI, SHANGAHI HUALI MICROELECTRONICS CORP and CHIME BALL TECHNOLOGY CO LTD.

Patent filings in countries

World map showing SOLTEC KKs patent filings in countries
# Country Total Patents
#1 Japan 41

Patent filings per year

Chart showing SOLTEC KKs patent filings per year from 1900 to 2020

Focus industries

Top inventors

# Name Total Patents
#1 Tanaka Toshihiko 15
#2 Morigami Mitsuaki 9
#3 Kato Katsuhiro 6
#4 Okada Koichi 5
#5 Yamashita Yoshio 4
#6 Oiizumi Hiroaki 3
#7 Atoda Nobufumi 3
#8 Ito Toru 3
#9 Tokawa Iwao 3
#10 Okuyama Hiroshi 2

Latest patents

Publication Filing date Title
JPH09115823A Mask for exposure and production thereof
JPH0982629A Forming method of resist pattern
JPH0963947A X-ray-resistant silicon nitride film ahd manufacture of x-ray mask
JPH0927418A Electromagnetic solenoid driving device and winning-prize device for pinball machine using thereof
JPH08241853A Rinsing solution drying method and device
JPH0864508A Pattern formation
JPH07312339A Method and apparatus for proximity exposure
JPH07307280A Mask for x-ray exposure
JPH07272926A Electromagnetic driver and pachinko board prize-winning device using the same
JPH07263322A Stepper using extreme ultraviolet rays
JPH07254554A Rinse solution drying method and its equipment
JPH07183199A Pattern formation method and aligner and pattern formation device
JPH0719811A Method for detecting dislocation and gap
JPH06323812A Method for detecting positional shift and gap
JPH06307811A Dislocation and gap sensing method
JPH06302493A Method and device for proximity exposure
JPH06273599A Radiation light exposure device
JPH06275514A Resist pattern forming method
JPH07225113A Method for detecting positional deviation and gap
JPH06241728A Detection method for position deviation and gap