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SHINKO SEIKI

Overview
  • Total Patents
    182
  • GoodIP Patent Rank
    83,700
  • Filing trend
    ⇩ 75.0%
About

SHINKO SEIKI has a total of 182 patent applications. It decreased the IP activity by 75.0%. Its first patent ever was published in 1974. It filed its patents most often in Japan, Republic of Korea and United States. Its main competitors in its focus markets surface technology and coating, semiconductors and audio-visual technology are HERMES-EPITEK CORP, JETEK INC and COMPASS TECH COMPANY LIMITED.

Patent filings in countries

World map showing SHINKO SEIKIs patent filings in countries
# Country Total Patents
#1 Japan 177
#2 Republic of Korea 2
#3 United States 2
#4 China 1

Patent filings per year

Chart showing SHINKO SEIKIs patent filings per year from 1900 to 2020

Top inventors

# Name Total Patents
#1 Terayama Nobuyuki 38
#2 Kawashita Yasushi 26
#3 Nakasone Masami 21
#4 Noma Masao 19
#5 Takeuchi Tatsuya 13
#6 Hagiwara Taizo 12
#7 Komatsu Eiji 11
#8 Shimizu Nobuyuki 10
#9 Fujitaka Rokusuke 8
#10 Suzuki Akira 8

Latest patents

Publication Filing date Title
JP2020117787A Film deposition apparatus by magnetron sputtering method and film deposition method
JP2019189930A Reactive ion plating device and method
JP2019121422A Surface processing device
JP2018123379A Ion plating apparatus and method for forming yttria film using the same
JP2018119185A Formation method of decorative film by magnetron sputtering method
JP2018115356A Deposition apparatus and deposition method for reaction film by magnetron sputtering method
JP2018070977A Method of forming carbon nitride film
JP2018034162A Heating method and heater
JP2018023431A Ophthalmologic examination apparatus
JP2018021223A Film deposition apparatus and film deposition method
JP2017123399A Dry etching apparatus and method
JP2017101265A Hydrogen-containing carbonized oxidized silicon film, and forming method thereof
JP2017088976A Multicomponent film formation apparatus and multicomponent film formation method
JP2017066483A Film deposition apparatus and method using magnetron sputtering technique
JP2017031001A Diamond-like carbon powder and production method of the same
JP2017020056A Alloy nitride film formation device and alloy nitride film formation method
JP2016156080A Ion nitriding treatment method and ion nitriding treatment device
JP2016084516A Plasma surface treatment device
JP2016074932A Hard coating, and method and device for forming the same
JP2014190877A Surface modification layer characteristic evaluation device and characteristic evaluation method of surface modification layer