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SHINCRON KK

Overview
  • Total Patents
    100
  • GoodIP Patent Rank
    202,691
About

SHINCRON KK has a total of 100 patent applications. Its first patent ever was published in 1992. It filed its patents most often in Japan. Its main competitors in its focus markets surface technology and coating, electrical machinery and energy and optics are SHINCRON CO LTD, FHR ANLAGENBAU GMBH and APPLIED VISION LTD.

Patent filings in countries

World map showing SHINCRON KKs patent filings in countries
# Country Total Patents
#1 Japan 100

Patent filings per year

Chart showing SHINCRON KKs patent filings per year from 1900 to 2020

Top inventors

# Name Total Patents
#1 Kyo Yusho 31
#2 So Matashiyu 22
#3 Shiono Ichiro 20
#4 Kikuchi Kazuo 18
#5 Matsumoto Shigeji 17
#6 Zaisho Shinichiro 16
#7 Sakurai Takeshi 14
#8 Odagiri Akira 11
#9 Chiba Koki 9
#10 Yoda Hirokuni 8

Latest patents

Publication Filing date Title
JP2020180318A Method for depositing metal compound film and reactive sputtering apparatus
JP2020084240A Film deposition method of metal compound film and reactive sputtering apparatus
JP2015034348A Film deposition method and film deposition apparatus
JP2015229779A Portable rotary apparatus and film deposition apparatus
JP2013079440A Thin film forming apparatus
JP2011102436A Thin film deposition method and thin film deposition system
JP2012082463A Thin-film formation method and thin-film formation device
JP2010174378A Method for depositing thin film
JP2011127198A Solar battery cover, method for producing it and snow-melting method
JP2010242176A Film deposition apparatus and film deposition method
JP2010201339A Method for depositing thin film
JP2010202890A Film deposition method and film deposition system
JP2010111902A Film deposition method and film deposition apparatus
JP2010111903A Film deposition method
JP2010106339A Film deposition method and film deposition apparatus
JP2010100918A Film deposition apparatus
JP2010090454A Film deposition method
JP2010077483A Method for manufacturing optical filter
JP2010065264A Method for depositing thin film and apparatus for depositing thin film
JP2010018830A Sputtering system