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JPH03207856A
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Thin film producing device
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JPH03197668A
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Evaporating source and evaporating device formed by using this source
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JPH03197674A
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Method for continuously forming thin film in vacuum
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JPH03193873A
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Continuous formation of thin film in vacuum and device
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JPH03193874A
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Continuous formation of thin film in vacuum
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JPH03176913A
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Manufacture of thin transparent conductive semiconductor film
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JPH02228472A
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Sputtering device
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JPS63317671A
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Method and device for sputtering
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JPS6314863A
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Vacuum device
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JPS62284076A
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Formation of thin film and its device
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JPS62284070A
|
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Sputtering method
|
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JPS62263968A
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Formation of aluminum film
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JPS62253768A
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Device for producing thin film
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JPS6277461A
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Backing plate for high frequency sputtering electrode
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JPS61295370A
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Sputtering device
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JPS61295368A
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Cathode for magnetron sputtering
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JPS616271A
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Method and device for bias ion plating
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JPS60251269A
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Method and apparatus for ionic plating
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JPS60197874A
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Magnetron sputtering device
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JPS60156984A
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Automatic control device in vacuum atmosphere
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