| # | Country | Total Patents | |
|---|---|---|---|
| #1 | United States | 11 | |
| #2 | Canada | 1 |
| # | Industry | |
|---|---|---|
| #1 | Optics | |
| #2 | Measurement | |
| #3 | Audio-visual technology | |
| #4 | Textiles and paper | |
| #5 | Machines | |
| #6 | Computer technology |
| # | Name | Total Patents |
|---|---|---|
| #1 | Sandstroem Torbjoern | 12 |
| #2 | Wahlsten Mikael | 2 |
| #3 | Svensson Anders | 2 |
| #4 | Ekberg Mats | 2 |
| #5 | Askebjer Per | 2 |
| #6 | Stiblert Lars | 1 |
| #7 | Lindau Sten | 1 |
| Publication | Filing date | Title |
|---|---|---|
| US2008316457A1 | Method and apparatus for quantification of illumination non-uniformity in the mask plane of a lithographic exposure system |