Integrated circuit structure and manufacturing method thereof
TWI639884B
Phase shift mask and fabrication method thereof
TWI639886B
Reticle and method for maintaining reticle stage
TWI640011B
Non-volatile memory device and error compensation method for verifying therefor
TWI645554B
Deep trench isolation of cmos image sensor and manufacturing method thereof
TW201915554A
Light pipe structure, manufacturing method tehreof and image sensing device
TWI639925B
Method for calculating multi-dimensional variables and estimating productivity, method for counting multi-dimensional variables and scheduling priority, and method for optimizing configuration of statistical multi-dimensional variables
TWI633408B
Regulated output device
CN109002367A
Non-volatile memory device, nonvolatile memory integrated circuit and operating method
TWI639847B
Integrated circuit chip and inspection method thereof
CN108962991A
Semiconductor element and its manufacturing method
TWI627711B
Vertical memory and manufacturing method thereof
TWI627440B
Image brightness reconfiguration module and image brightness reconfiguration method
TW201838149A
Semiconductor device and manufacturing method thereof
TW201838151A
Non-volatile memory structure and methods for preventing stylized interference