| # | Country | Total Patents | |
|---|---|---|---|
| #1 | Japan | 6 | |
| #2 | Republic of Korea | 3 | |
| #3 | Taiwan | 3 | |
| #4 | United States | 2 | |
| #5 | Singapore | 1 |
| # | Industry | |
|---|---|---|
| #1 | Semiconductors | |
| #2 | Electrical machinery and energy | |
| #3 | Surface technology and coating | |
| #4 | Machines | |
| #5 | Optics |
| # | Name | Total Patents |
|---|---|---|
| #1 | Kojima Kenichi | 7 |
| #2 | Soejima Yukio | 6 |
| #3 | Katsura Toshimi | 4 |
| #4 | Miyazawa Hideaki | 4 |
| #5 | Noguchi Takeshi | 3 |
| #6 | Sato Mitsuru | 2 |
| #7 | Yatsuno Komei | 2 |
| #8 | Gojima Genichi | 1 |
| #9 | Nakagami Shinji | 1 |
| #10 | Ayabe Tokihiro | 1 |
| Publication | Filing date | Title |
|---|---|---|
| KR20010096127A | Electrode for plasma processing apparatus and plasma processing apparatus | |
| JP2000299199A | Plasma generating device and plasma processing device | |
| JP2000200774A | Plasma processing device | |
| JP2000012295A | Plasma treatment device | |
| JP2000012296A | Plasma treatment device | |
| JPH11347502A | Substrate cleaning apparatus | |
| JPH11274132A | Method and device for cleaning substrate |