| # | Country | Total Patents | |
|---|---|---|---|
| #1 | United States | 14 |
| # | Industry | |
|---|---|---|
| #1 | Semiconductors | |
| #2 | Electrical machinery and energy | |
| #3 | Optics | |
| #4 | Surface technology and coating | |
| #5 | Chemical engineering |
| # | Technology | |
|---|---|---|
| #1 | Semiconductor devices | |
| #2 | Electric discharge tubes | |
| #3 | Plasma technique | |
| #4 | Photomechanical semiconductor production | |
| #5 | Metallic material removal |
| # | Name | Total Patents |
|---|---|---|
| #1 | Nishimura Eiichi | 14 |
| #2 | Yamashita Fumiko | 2 |
| #3 | Shimizu Yusuke | 1 |
| #4 | Kushibiki Masato | 1 |
| #5 | Kihara Yoshihide | 1 |
| #6 | Yoneyama Shimao | 1 |
| #7 | Yatsuda Koichi | 1 |
| #8 | Lin Lyndon | 1 |
| #9 | Tahara Shigeru | 1 |
| #10 | Inata Yasushi | 1 |
| Publication | Filing date | Title |
|---|---|---|
| US2008003836A1 | Substrate processing method and substrate processing apparatus | |
| US2007275560A1 | Method of manufacturing semiconductor device |