TOKYO ELECTON LTD has a total of 23 patent applications. Its first patent ever was published in 2001. It filed its patents most often in United States, China and Australia. Its main competitors in its focus markets semiconductors, electrical machinery and energy and surface technology and coating are NISHIMURA EIICHI, SASAKI YUICHIRO and KOCHI IND PROMOTION CT.
# | Country | Total Patents | |
---|---|---|---|
#1 | United States | 14 | |
#2 | China | 7 | |
#3 | Australia | 1 | |
#4 | WIPO (World Intellectual Property Organization) | 1 |
# | Industry | |
---|---|---|
#1 | Semiconductors | |
#2 | Electrical machinery and energy | |
#3 | Surface technology and coating | |
#4 | Chemical engineering | |
#5 | Optics | |
#6 | Audio-visual technology | |
#7 | Computer technology | |
#8 | Machines | |
#9 | Mechanical elements |
# | Name | Total Patents |
---|---|---|
#1 | Tanaka Takashi | 2 |
#2 | Nishimura Eiichi | 2 |
#3 | Iwashita Mitsuaki | 2 |
#4 | Miyoshi Hidenori | 1 |
#5 | Masanobu Sato Manabu Igarashi | 1 |
#6 | Leusink Gerrit | 1 |
#7 | Clark Robert | 1 |
#8 | Fujimoto Akihiro | 1 |
#9 | Yuichi Tani | 1 |
#10 | Johnson Wayne L | 1 |
Publication | Filing date | Title |
---|---|---|
US2008311687A1 | Method and apparatus for optimizing a gate channel | |
CN1992192A | Vertical boat and vertical heat processing apparatus for semiconductor process | |
US2006169209A1 | Substrate processing apparatus, substrate processing method, and storage medium storing program for implementing the method |