PIEZONICS CO LTD has a total of 15 patent applications. Its first patent ever was published in 2004. It filed its patents most often in Republic of Korea, United States and WIPO (World Intellectual Property Organization). Its main competitors in its focus markets surface technology and coating, semiconductors and electrical machinery and energy are WUXI HUIMING ELECTRONIC TECHNOLOGY CO LTD, CAMBRIDGE NANOTECH INC and INTELLIGENT SYSTEM INC.
# | Country | Total Patents | |
---|---|---|---|
#1 | Republic of Korea | 7 | |
#2 | United States | 3 | |
#3 | WIPO (World Intellectual Property Organization) | 3 | |
#4 | Japan | 2 |
# | Industry | |
---|---|---|
#1 | Surface technology and coating | |
#2 | Semiconductors | |
#3 | Electrical machinery and energy | |
#4 | Chemical engineering | |
#5 | Textiles and paper | |
#6 | Machines |
# | Technology | |
---|---|---|
#1 | Coating metallic material | |
#2 | Semiconductor devices | |
#3 | Single-crystal-growth | |
#4 | Electric discharge tubes | |
#5 | Separation | |
#6 | Typewriters | |
#7 | Unspecified technologies |
# | Name | Total Patents |
---|---|---|
#1 | Byun Chul Soo | 13 |
#2 | Han Man Cheol | 10 |
#3 | Chung Il Yong | 2 |
#4 | Lee Seok Woo | 1 |
#5 | Choi Young Seok | 1 |
#6 | Byun Chulsoo | 1 |
#7 | Chul Soo Byun | 1 |
#8 | Han Mancheol | 1 |
#9 | Lee Jaichan | 1 |
#10 | Kang Kyung Tae | 1 |
Publication | Filing date | Title |
---|---|---|
KR20090075649A | A showerhead for film depositing vacuum equipments | |
WO2009038326A2 | Scrubber using mesh filter and apparatus for exhaust gas treatment in semiconductor fabrication equipments using the same | |
KR20090031231A | Scrubber using mesh filter and apparatus for exhaust gas treatment in semiconductor fabrication equipment using the same | |
KR20090012068A | Apparatus having a substrate holder for film forming | |
KR20070112354A | Semiconductor device fabrication equipment with showerhead | |
WO2008032910A1 | Apparatus of chemical vapor deposition with a showerhead regulating injection velocity of reactive gases positively and method thereof | |
KR20080025277A | Apparatus of chemical vapor deposition with a showerhead regulating the injection velocity of reactive gases positively and a method thereof | |
KR20060120402A | Apparatus of chemical vapor deposition with a shower head and method therof |