| # | Country | Total Patents | |
|---|---|---|---|
| #1 | China | 3 | |
| #2 | EPO (European Patent Office) | 3 | |
| #3 | Republic of Korea | 3 | |
| #4 | WIPO (World Intellectual Property Organization) | 3 | |
| #5 | Singapore | 2 | |
| #6 | United States | 1 |
| # | Industry | |
|---|---|---|
| #1 | Surface technology and coating | |
| #2 | Chemical engineering |
| # | Technology | |
|---|---|---|
| #1 | Coating metallic material | |
| #2 | Separation |
| # | Name | Total Patents |
|---|---|---|
| #1 | Coutu Roger R | 7 |
| #2 | Sundaram Ganesh M | 7 |
| #3 | Becker Jill Svenja | 6 |
| #4 | Monsma Douwe J | 5 |
| #5 | Deguns Eric W | 5 |
| #6 | Becker Jill S | 5 |
| #7 | Dalberth Mark J | 3 |
| #8 | Sershen Michael J | 2 |
| #9 | Jill Svenja Becker | 1 |
| #10 | Ganesh M Sundaram | 1 |
| Publication | Filing date | Title |
|---|---|---|
| KR20130103754A | Ald coating system | |
| WO2011160004A1 | Method and apparatus for precursor delivery | |
| EP2401417A2 | Ald systems and methods | |
| US2010183825A1 | Plasma atomic layer deposition system and method | |
| EP1771598A2 | Atomic layer deposition (ald) system and method | |
| CN101040060A | Gas-phase deposition system and method |