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Method and apparatus for performing optical measurements of layers and surface properties
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Method and apparatus for determining processing chamber cleaning or wafer etching endpoint
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Cell control method and apparatus
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Spectrometric method for analysis of film thickness and composition on a patterned sample
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System including unified beamsplitter and parallel reflecting element, and retroreflecting component
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Flexture plate motion-transfer mechanism, beam-splitter assembly, and interferometer incorporating the same
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Method and apparatus for monitoring layer processing
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Method and apparatus for monitoring layer processing
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Method and apparatus for signal compression
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Apparatus and method for determining high temperature surface emissivity through reflectance and radiance measurements
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