CN106876378A
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A kind of plural layers integrated passive devices and its manufacture method
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CN106652923A
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High-stability and wide-range brightness adjusting method for LED backlight, and high-stability and wide-range LED backlight driving circuit
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CN106896492A
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Two-piece type lll night vision eyepiece optical system
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CN106887530A
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The thin-film packing structure and preparation method of a kind of organic electroluminescence device
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CN106652959A
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Silicon-based microdisplay column selection drive method and circuit suitable for high-frequency applications
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CN106898638A
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A kind of SiC schottky diode structure and preparation method for improving surge capacity
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CN106785251A
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Mode transmission ultra-broadband digital phase shifter
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CN106684142A
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Gallium nitride device schottky contact system with composite metal barrier layer
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CN106653689A
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Method for dual-pulse frequency laser separation of composite SiC
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CN106711022A
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Preparation method for growing silicon carbide epitaxial film with clear doping interface
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CN106803479A
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A kind of preparation method of the silicon carbide epitaxial wafer for improving effective area
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CN106672892A
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Method for reducing depressed deformation of sacrificial layer in three-dimensional stacking in chemical mechanical polishing
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CN106783847A
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For the three-dimensional bonding stacked interconnected integrated manufacturing method of radio frequency micro-system device
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CN106646971A
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Method and structure capable of improving heating evenness of liquid crystal screen component
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CN106876514A
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Vacuum semiconductor hybrid optical electric explorer
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CN106783623A
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The two-dimensional material field-effect transistor and its manufacture method of a kind of inverted T shape buried grid structure
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CN106783998A
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A kind of GaN high electron mobility transistor based on diamond substrate and preparation method thereof
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CN106783558A
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A kind of low on-resistance hydrogen terminal diamond field effect transistor and preparation method thereof
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CN106711031A
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Method for reducing effect of base plane dislocation on silicon carbide epitaxial layer
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CN106783540A
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The method for reducing epitaxial wafer surface scratch
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