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NEPESAMC

Overview
  • Total Patents
    15
  • GoodIP Patent Rank
    192,938
  • Filing trend
    ⇩ 100.0%
About

NEPESAMC has a total of 15 patent applications. It decreased the IP activity by 100.0%. Its first patent ever was published in 2007. It filed its patents most often in Republic of Korea, China and WIPO (World Intellectual Property Organization). Its main competitors in its focus markets macromolecular chemistry and polymers, semiconductors and electrical machinery and energy are MOMENTIVE PERFORMANCE MATERIALS KOREA CO LTD, MOMENTIVE PERFORMANCE MAT KOREA CO LTD and INKRON OY.

Patent filings in countries

World map showing NEPESAMCs patent filings in countries

Patent filings per year

Chart showing NEPESAMCs patent filings per year from 1900 to 2020

Top inventors

# Name Total Patents
#1 Cho Sung Woo 7
#2 Cho Chul Hui 5
#3 Hwang Pung Koc 3
#4 Choi Pyoung Ho 2
#5 Lee Jae Ung 2
#6 Kim Hun 2
#7 Hong Hak Pyo 2
#8 Kang Il Ho 2
#9 Yoo Byung Ho 2
#10 Song Gwang Seok 2

Latest patents

Publication Filing date Title
KR20190029263A One-component type epoxy resin for sealing semiconductor
KR20170123394A Coating composition with improved thermal conductivity and method of forming coating film
KR20170015867A Light emitting device
KR20170012724A Light emitting device
KR101452981B1 Epoxy resin composition, process for producing the same, substrate made therefrom for photosemiconductor element mounting, and photosemiconductor device having the same
KR101405532B1 Epoxy resin composition, And Photosemiconductor device having the same
KR20140120732A Coating solution, method of preparing thereof, method of preparing coated glass using the coating solution and coated glass using the same
KR20140118387A Catechol graft copolymer, complex including the same and method for preparing thereof
CN103562290A Thermosetting resin composition for light reflection, preparation method thereof, reflecting plate for loading photonic semiconductor prepared therefrom, and photonic semiconductor device containing same
KR101092015B1 Thermosetting resin composition for light reflection, process for producing the same, substrate made therefrom for photosemiconductor element mounting, and photosemiconductor device
KR100967613B1 Semi-crosslinked epoxy resin composition and method for preparation of the same
KR20080101515A Process for production epoxy resin composition