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NAGASE KASEI KOGYO KK

Overview
  • Total Patents
    71
About

NAGASE KASEI KOGYO KK has a total of 71 patent applications. Its first patent ever was published in 1982. It filed its patents most often in Japan and United States. Its main competitors in its focus markets optics, basic materials chemistry and textiles and paper are MIRACLON CORP, ROTOPHOT AKT GES FUER GRAPHISC and SHANGHAI DONGSHEN ELECTRONIC TECHNOLOGY CO LTD.

Patent filings in countries

World map showing NAGASE KASEI KOGYO KKs patent filings in countries
# Country Total Patents
#1 Japan 70
#2 United States 1

Patent filings per year

Chart showing NAGASE KASEI KOGYO KKs patent filings per year from 1900 to 2020

Top inventors

# Name Total Patents
#1 Tanaka Ikuya 25
#2 Onishi Toshimasa 21
#3 Oonishi Toshimasa 14
#4 Tojo Tamaki 12
#5 Fujii Satoru 9
#6 Kotani Takeshi 9
#7 Morita Takayuki 9
#8 Yamamoto Yoshi 8
#9 Nishijima Yoshitaka 6
#10 Takarayama Takahiro 5

Latest patents

Publication Filing date Title
JP2002284612A Antimicrobial composition
JP2002284605A Antimicrobial composition
JP2002284606A Antimicrobial composition
JP2002285472A Method of antibacterial processing of fibers
JP2002282667A Stirring apparatus
JP2002278091A Photoresist remover composition and method for removing photoresist using the same
JP2002236375A Composition of resist peeling agent
JP2002217164A Composition of etching solution
JP2002194052A Water-soluble curable epoxy (meth)acrylate, its production and use thereof
JP2002196509A Photoresist remover composition and method for using the same
JP2002179732A Water-soluble resin and composition using the resin
JP2002145999A Photopolymerizable unsaturated resin and photosensitive resin composition containing the resin
JP2002128608A Antimicrobial agent composition
JP2002128609A Antimicrobial agent composition
JP2002105168A Epoxyacrylate resin and resin composition containing the resin
JP2002088136A Photopolymerizable unsaturated resin and photosensitive resin composition containing the resin
JP2002072506A Photoresist removing agent composition and method for using the same
JP2002072505A Photoresist-removing agent composition and method for use thereof
JP2001356496A Photoresist remover composition and method for using the same
JP2001350276A Photoresist remover composition and method for using the same