Learn more

MILLWARD DAN B

Overview
  • Total Patents
    31
About

MILLWARD DAN B has a total of 31 patent applications. Its first patent ever was published in 2002. It filed its patents most often in United States and WIPO (World Intellectual Property Organization). Its main competitors in its focus markets micro-structure and nano-technology, optics and machines are CHENG JOY, BLACK CHARLES T and TELEDYNE DALSA SEMICONDUCTOR INC.

Patent filings in countries

World map showing MILLWARD DAN Bs patent filings in countries

Patent filings per year

Chart showing MILLWARD DAN Bs patent filings per year from 1900 to 2020

Top inventors

# Name Total Patents
#1 Millward Dan B 31
#2 Westmoreland Donald 4
#3 Marsh Eugene P 2
#4 Quick Timothy A 2
#5 Sills Scott E 2
#6 Quick Timothy 2
#7 Sandhu Gurtej 2
#8 Greeley J Neil 2
#9 Stuen Karl 2
#10 Light Scott 1

Latest patents

Publication Filing date Title
US2013127021A1 Methods for adhering materials, for enhancing adhesion between materials, and for patterning materials, and related semiconductor device structures
US2012177891A1 Methods of forming a patterned, silicon-enriched developable antireflective material and semiconductor device structures including the same
US2012046415A1 Methods of forming block copolymers
US2010102415A1 Method for selectively permeating a self-assembled block copolymer, method for forming metal oxide structures, method for forming a metal oxide pattern, and method for patterning a semiconductor structure
US2009274887A1 Graphoepitaxial self-assembly of arrays of downward facing half-cylinders
US2009263628A1 Multi-layer method for formation of registered arrays of cylindrical pores in polymer films
US2009236309A1 Thermal anneal of block copolymer films with top interface constrained to wet both blocks with equal preference
US2009200646A1 One-dimensional arrays of block copolymer cylinders and applications thereof
US2010316849A1 Method to produce nanometer-sized features with directed assembly of block copolymers
US2008318005A1 Crosslinkable graft polymer non-preferentially wetted by polystyrene and polyethylene oxide
US2008311347A1 Alternating self-assembling morphologies of diblock copolymers controlled by variations in surfaces
US2008274413A1 Sub-10 nm line features via rapid graphoepitaxial self-assembly of amphiphilic monolayers
US2008217292A1 Registered structure formation via the application of directed thermal energy to diblock copolymer films
US2008176767A1 Two-dimensional arrays of holes with sub-lithographic diameters formed by block copolymer self-assembly